Photoresponsive surface molecularly imprinted poly(ether sulfone) microfibers.
Dongsheng Wang, Xiaoxue Zhang, Shengqiang Nie, Weifeng Zhao, Yi Lu, Shudong Sun, Changsheng Zhao
Index: Langmuir 28(37) , 13284-93, (2012)
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Abstract
In the present study, photoresponsive surface molecularly imprinted poly(ether sulfone) microfibers are prepared via nitration reaction, the wet-spinning technique, surface nitro reduction reaction, and surface diazotation reaction for the selectively photoregulated uptake and release of 4-hydrobenzoic acid. The prepared molecularly imprinted microfibers show selective binding to 4-HA under irradiation at 450 nm and release under irradiation at 365 nm. The simple, convenient, effective, and productive method for the preparation of azo-containing photoresponsive material is also applied to the modification of polysulfone and poly(ether ether ketone). All three benzene-ring-containing polymers show significant photoresponsibility after the azo modification.
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