Name | Dibenzyl phosphite |
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Synonyms |
EINECS 241-226-1
dibenzylphosphite Phosphorous Acid Dibenzyl Ester O,O'-DIBENZYLPHOSPHINE Phosphonic Acid Dibenzyl Ester Dipenzylphosphit DIBENZYL PHOSPHITE,TECH. Dibenzyl Phosphite DIBENZYL PHOSPHONATE MFCD00004774 |
Density | 1.187 g/mL at 25 °C(lit.) |
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Boiling Point | 110-120 °C0.01 mm Hg(lit.) |
Melting Point | 17ºC |
Molecular Formula | C14H15O3P |
Molecular Weight | 262.24100 |
Flash Point | >230 °F |
Exact Mass | 262.07600 |
PSA | 59.00000 |
LogP | 3.80970 |
Vapour Pressure | 0mmHg at 25°C |
Index of Refraction | n20/D 1.555(lit.) |
Storage condition | 2-8°C |
Personal Protective Equipment | Eyeshields;Gloves |
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Hazard Codes | Xi:Irritant; |
Risk Phrases | R36/37/38 |
Safety Phrases | S37/39-S26-S36 |
RIDADR | UN3278 |
WGK Germany | 3 |
Packaging Group | III |
Hazard Class | 6.1 |
HS Code | 2920909090 |
~95% 17176-77-1 |
Literature: Perruchon, Johann; Ortmann, Regina; Schlitzer, Martin Synthesis, 2007 , # 22 p. 3553 - 3557 |
~% 17176-77-1 |
Literature: Fisher, Henry C.; Prost, Lucie; Montchamp, Jean-Luc European Journal of Organic Chemistry, 2013 , # 35 p. 7973 - 7978 |
~% 17176-77-1 |
Literature: Journal of the Chemical Society, , p. 677 Journal of the Chemical Society, , p. 382,384 Biochemical Preparations, , vol. 5, p. 1,2 |
~% 17176-77-1 |
Literature: Journal of the Chemical Society, , p. 815,819 |
~80% 17176-77-1 |
Literature: Arimilli, Murty N.; Becker, Mark M.; Birkus, Gabriel; Bryant, Clifford; Chen, James M.; Chen, Xiaowu; Cihlar, Tomas; Dastgah, Azar; Eisenberg, Eugene J.; Fardis, Maria; Hatada, Marcos; He, Gong-Xin; Jin, Haolun; Kim, Choung U.; Lee, William A.; Lee, Christopher P.; Lin, Kuei-Ying; Liu, Hongtao; MacKman, Richard L.; McDermott, Martin J.; Mitchell, Michael L.; Nelson, Peter H.; Pyun, Hyung-Jung; Rowe, Tanisha D.; Sparacino, Mark; Swaminathan, Sundaramoorthi; Tario, James D.; Wang, Jianying; Williams, Matthew A.; Xu, Lianhong; Yang, Zheng-Yu; Yu, Richard H.; Zhang, Jiancun; Zhang, Lijun Patent: US2005/239054 A1, 2005 ; |
~51% 17176-77-1 |
Literature: Arimilli, Murty N.; Becker, Mark M.; Birkus, Gabriel; Bryant, Clifford; Chen, James M.; Chen, Xiaowu; Cihlar, Tomas; Dastgah, Azar; Eisenberg, Eugene J.; Fardis, Maria; Hatada, Marcos; He, Gong-Xin; Jin, Haolun; Kim, Choung U.; Lee, William A.; Lee, Christopher P.; Lin, Kuei-Ying; Liu, Hongtao; MacKman, Richard L.; McDermott, Martin J.; Mitchell, Michael L.; Nelson, Peter H.; Pyun, Hyung-Jung; Rowe, Tanisha D.; Sparacino, Mark; Swaminathan, Sundaramoorthi; Tario, James D.; Wang, Jianying; Williams, Matthew A.; Xu, Lianhong; Yang, Zheng-Yu; Yu, Richard H.; Zhang, Jiancun; Zhang, Lijun Patent: US2005/239054 A1, 2005 ; |
~% 17176-77-1 |
Literature: Journal of the Chemical Society, , p. 1106,1111 |
Precursor 9 | |
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DownStream 10 | |
HS Code | 2920909090 |
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Summary | 2920909090 esters of other inorganic acids of non-metals (excluding esters of hydrogen halides) and their salts; their halogenated, sulphonated, nitrated or nitrosated derivatives。Supervision conditions:None。VAT:17.0%。Tax rebate rate:9.0%。MFN tariff:6.5%。General tariff:30.0% |